Varian Quantum
AMAT Endura13"
AMAT Endura13"
ANELVA ILC1060
AMAT Endura13" Long Life
ULVAC Z1000
Varian Quantum
AMAT Endura13"
AMAT Endura13"
ANELVA ILC1060
AMAT Endura13" Long Life
ULVAC Z1000

Model number： p-01

Sputtering Targets

High Purity × Diverse Materials × Precision Manufacturing

Scientia supplies high-purity sputtering targets that are widely used in the semiconductor, optoelectronics, and precision electronics industries. In advanced processes and thin-film deposition, the purity and stability of the target material play a decisive role in film performance and production yield. With strict process control, we deliver sputtering targets up to 5N (99.999%) purity, meeting the demanding requirements for material consistency and reliability in high-end semiconductor manufacturing.

Key Features & Advantages

High Purity Standards

  • Up to 5N (99.999%) purity for minimal particles and process stability.

  • Ensures superior thin-film quality in advanced applications.

Wide Material Coverage

  • Available in pure metals, alloys, and oxides (Al, Ti, Ta, Cu, W, Ni, Cr, NiV, ITO, ZnO).

  • Flexible options to match diverse process requirements.

Precision Processing & Testing

  • Advanced methods: vacuum melting, HIP, precision grinding, polishing.

  • Rigorous testing ensures high density and dimensional accuracy.

Material Categories

 

Al

Ti

Ta

Cu

W

Ni

Cr

NiV

ITO

ZnO

Pure Metals

V

V

V

V

V

V

V

 

 

 

Alloys

 

 

 

 

 

 

 

V

 

 

Metal Oxides

 

 

 

 

 

 

 

 

V

V

Applications

  • Semiconductor Manufacturing: Thin-film deposition and barrier layers in PVD processes.

  • Optoelectronics: Display panels, optical coatings, and sensor production.

  • Precision Electronics: Hard disk read heads, MEMS devices, and high-frequency communication components.

  • Third-Generation Semiconductors: Metallization and packaging processes for SiC and GaN substrates.

Looking for reliable sputtering targets? Get in touch today for data sheets and solutions.